Film thickness and film quality analysis of ultra-thin films

Semiconductors

Film thickness and film quality analysis of ultra-thin films

SiO₂ film analysis of 脜 order thin film using spectroscopic ellipsometer

Treatments are sometimes applied to improve the film quality of ultra-thin SiO鈧� films deposited on Si substrates, and the UVISEL Plus can identify slight differences in film thickness and film quality before and after the treatment.

Through the treatment, a change in film thickness of several 脜 and a slight change in refractive index was confirmed . As a result of this treatment, the film thickness decreased, and an increase in refractive index suggests that the film became denser.

Spectroscopic Ellipsometer UVISEL Plus

Evaluation of optical constants for film thickness on the order of 脜
The phase modulation method and temperature control function, which do not involve mechanical movement, suppress the effects of vibrations and enable reliable evaluation with a high signal-to-noise ratio.
Film thickness evaluation up to 85 渭m (depending on film condition)
High wavelength resolution and unique optical system enable film thickness evaluation over a wide range.

UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

禄&苍产蝉辫;Link to Spectroscopic Ellipsometry

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