蓝鲸体育直播

GR-511F

Wafer Back Side Cooling System

The GR-511F can control gases used to cool the back side of wafers that are fixed in position by an electrostatic chuck system.

The stability and accuracy of the GR-511F makes it ideal for controlling the flow of Helium and Argon in wafer cooling systems.

小械谐屑械薪褌: Semiconductor
袩芯写褉邪蟹写械谢械薪懈械: Fluid Control
袩褉芯懈蟹胁芯写懈褌械谢褜: 蓝鲸体育直播 STEC, Co., Ltd.
  • Pressure control with more stability and accuracy
  • Mass flow sensor (Option)
  • Compatible for various fitting
  • RoHS compliance

 

Application example

In the below example, the GR-511F is controling the gases used to cool the back side of wafers that are fixed in position by an electrostatic chuck system.


 




 

ModelGR-511F
Valve TypeC: Normally close
Leak integrity鈮 7 脳 10-11 Pa路m3 /s (He)
Maximum operating pressure300 kPa (A)
Pressure resistance350 kPa (A)
Operating temperature5-50 掳C (Accuracy guaranteed temp : 15-40 掳C)
Power supply+15 VDC卤5 %, 250 mA -15 VDC卤5 %, 250 mA
Power consumption7.5 VA
InterfaceAnalog
Gas *1He, Ar, N2
Standard fittings1/4 inch VCR or equivalent
Pressure full scale1.333 kPa (A) (10 Torr), 2.666 kPa (A) (20 Torr),
6.666 kPa (A) (50 Torr)
Pressure control range1-100 %F.S.
Pressure accuracy *2卤0.5 %R.S.
Zero temperature coefficient卤0.04 %F.S./掳C
Span temperature coefficient卤0.04 %R.S./掳C
Response *3鈮 1 sec
Pressure setting signal0.1-10 VDC (1-100 %F.S.) Input impedance 鈮 1 M惟
Option:0.05-5 VDC (1-100 %F.S.) Input impedance鈮 1 M惟
Pressure output signal0-10 VDC (0-100 %F.S.) Minimum resistance 2 k惟
Option:0-5 VDC (0-100 %F.S.) Minimum resistance 2 k惟
Flow full scale *120, 50, 100 SCCM
Flow accuracy *4 *5卤1 %R.S. (Flow rate > 25 %F.S.)
卤0.25 %F.S. (Flow rate 鈮 25 %F.S.)
Flow rate output signal0-5 VDC (0-100 %F.S.) Minimum resistance 2 k惟
Wetted materialSUS316L
Mounting orientation *6Free
Weight *71.5 kg

*1 Please consult about other specifications.
*2 Guaranteed only for STEC calibration condition.
*3 Guaranteed only for calibration gas (N2) and calibration condition. Depends on gas or usage condition, response time may be changed.
*4 Flow accuracy complies with SEMI E56-0309. Guaranteed for calibration gas (N2), full scale and pressure condition.
*5 A flow rate exceeding 100% F.S. cannot be guaranteed for accuracy.
*6 Please make a zero point adjustment for both pressure and flow rate in an actual-use environment to eliminate mounting operation effect.
*7 Reference value with standard fitting. 路In notation of pressure unit, (A) shows absolute pressure. 路SCCM is symbol representing the gas flow rate (ml/min, at 0掳C 101.3 kPa) . 路F.S. is a percentage of the full scale and %R.S. is a percentage of the reading scale.

袟邪锌褉芯褋懈褌褜 懈薪褎芯褉屑邪褑懈褞

校 胁邪褋 械褋褌褜 胁芯锌褉芯褋褘 懈谢懈 锌芯卸械谢邪薪懈褟? 袠褋锌芯谢褜蟹褍泄褌械 褝褌褍 褎芯褉屑褍, 褔褌芯斜褘 褋胁褟蟹邪褌褜褋褟 褋 薪邪褕懈屑懈 褋锌械褑懈邪谢懈褋褌邪屑懈.

* 协褌懈 锌芯谢褟 芯斜褟蟹邪褌械谢褜薪褘 写谢褟 蟹邪锌芯谢薪械薪懈褟.

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