蓝鲸体育直播

Semiconductors

Film quality analysis of silicon oxide film

<< Back to Film Thickness Analysis

Changes in film quality within the same type of film using a spectroscopic ellipsometer

The quality of SiO鈧� thin films on Si substrates may change during the process from the start of film formation. With UVISEL Plus, you can evaluate the difference based on the difference in refractive index.

Spectroscopic Ellipsometer UVISEL Plus

  • Evaluation of optical constants for film thickness on the order of 脜
    The phase modulation method and temperature control function, which do not involve mechanical movement, suppress the effects of vibrations and enable reliable evaluation with a high signal-to-noise ratio.
  • Film thickness evaluation up to 85 渭m (depending on film condition)
    High wavelength resolution and unique optical system enable film thickness evaluation over a wide range.
UVISEL Plus
UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

禄&苍产蝉辫;Link to Spectroscopic Ellipsometry

Wniosek o udzielenie informacji

Masz pytania lub pro艣by? Skorzystaj z tego formularza, aby skontaktowa膰 si臋 z naszymi specjalistami.

* Te pola s膮 obowi膮zkowe.

You might also like to know