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Semiconductors

In situ thin film evaluation

<< Back to Film Thickness Analysis

In-chamber wafer analysis by incorporating analytical parts into the chamber

By irradiating light from outside the chamber and detecting the reflected light from the sample outside the chamber, thin films can be evaluated without exposing the sample to the atmosphere.

Spectroscopic Ellipsometer UVISEL Plus

  • Evaluation of optical constants for film thickness on the order of 脜
    The phase modulation method and temperature control function, which do not involve mechanical movement, suppress the effects of vibrations and enable reliable evaluation with a high signal-to-noise ratio.
  • Film thickness evaluation up to 85 渭m (depending on film condition)
    High wavelength resolution and unique optical system enable film thickness evaluation over a wide range.
UVISEL Plus
UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

禄&苍产蝉辫;Link to Spectroscopic Ellipsometry

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